UV & EB curing feem ntau piav qhia txog kev siv hluav taws xob hluav taws xob (EB), ultraviolet (UV) lossis pom lub teeb kom polymerize ua ke ntawm monomers thiab oligomers mus rau hauv lub substrate. Cov khoom siv UV & EB tuaj yeem tsim ua tus cwj mem, txheej, nplaum lossis lwm yam khoom. Cov txheej txheem tseem hu ua hluav taws xob kho lossis radcure vim UV thiab EB yog qhov chaw muaj zog. Lub zog qhov chaw rau UV lossis pom lub teeb kho yog feem ntau nruab nrab siab mercury teeb, pulsed xenon teeb, LEDs lossis lasers. EB-tsis zoo li photons ntawm lub teeb, uas zoo li yuav nqus tau los ntawm cov khoom siv-muaj peev xwm nkag mus los ntawm cov teeb meem.
Peb Lub Cev Uas Yuav Tsum Hloov Rau UV & EB Technology
Kev txuag hluav taws xob thiab txhim kho cov khoom tsim tau zoo: Vim tias feem ntau cov tshuab tsis muaj kuab lom thiab xav tau tsawg dua li ib ob ntawm qhov raug, cov khoom tsim tau tuaj yeem ua tau zoo heev piv rau cov txheej txheem txheej txheem. Web kab ceev ntawm 1,000 ft / min. yog ib yam thiab cov khoom tam sim ntawd npaj rau kev kuaj thiab xa khoom xa tuaj.
Haum rau Sensitive Substrates: Feem ntau cov tshuab tsis muaj dej lossis hnyav. Tsis tas li ntawd, cov txheej txheem muab tag nrho cov kev tswj ntawm kev kho qhov kub thiab txias ua rau nws zoo tagnrho rau daim ntawv thov ntawm tshav kub rhiab substrates.
Environmentally thiab User Friendly: Cov khoom sib xyaw feem ntau yog hnyav-dawb yog li emissions thiab flammability tsis muaj kev txhawj xeeb. Lub teeb kho tshuab tau sib haum nrog yuav luag txhua daim ntawv thov cov txheej txheem thiab yuav tsum muaj qhov tsawg kawg nkaus. UV teeb feem ntau tuaj yeem ntsia tau rau ntawm cov kab ntau lawm.
UV & EB Curable Compositions
Monomers yog lub tsev thaiv yooj yim tshaj plaws los ntawm cov khoom siv hluavtaws tsim. Ib qho yooj yim monomer muab tau los ntawm roj av pub yog ethylene. Nws yog sawv cev los ntawm: H2C = CH2. Lub cim "=" ntawm ob chav lossis atoms ntawm carbon sawv cev rau qhov chaw reactive lossis, raws li kws tshuaj xa mus rau nws, "ob daim ntawv cog lus" lossis tsis txaus. Nws yog qhov chaw zoo li cov no uas muaj peev xwm ua rau cov ntaub ntawv loj dua lossis loj dua tshuaj hu ua oligomers thiab polymers.
Ib tug polymer yog ib pawg ntawm ntau (ie poly-) rov ua dua units ntawm tib monomer. Lub sij hawm oligomer yog ib lub sij hawm tshwj xeeb siv los xaiv cov polymers uas feem ntau tuaj yeem ua rau muaj kev cuam tshuam ntxiv los tsim kev sib txuam loj ntawm cov polymers. Cov chaw tsis txaus ntseeg ntawm oligomers thiab monomers ib leeg yuav tsis muaj kev cuam tshuam lossis kev sib txuas.
Nyob rau hauv cov ntaub ntawv ntawm electron beam kho, lub siab zog electrons cuam tshuam ncaj qha nrog lub atoms ntawm lub unsaturated site los tsim ib tug heev reactive molecule. Yog tias UV lossis pom lub teeb raug siv los ua lub zog, lub photoinitiator ntxiv rau qhov sib tov. Lub photoinitiator, thaum raug lub teeb, generates dawb radical los yog ua uas pib crosslinking ntawm unsaturation sites.ponents ntawm UV & ude
Oligomers: Tag nrho cov khoom ntawm txhua txheej txheej, number case, nplaum los yog khi crosslinked los ntawm lub zog hluav taws xob yog txiav txim siab feem ntau los ntawm oligomers siv hauv kev tsim. Oligomers yog me ntsis qis molecular hnyav polymers, feem ntau yog raws li acrylation ntawm cov qauv sib txawv. Lub acrylation imparts lub unsaturation los yog "C = C" pawg mus rau qhov kawg ntawm lub oligomer.
Monomers: Monomers feem ntau yog siv los ua cov diluents kom txo cov viscosity ntawm cov khoom tsis kho kom yooj yim rau kev thov. Lawv tuaj yeem ua tau monofunctional, muaj tsuas yog ib pawg reactive lossis qhov chaw tsis txaus ntseeg, lossis ntau yam haujlwm. Qhov kev tsis txaus ntseeg no tso cai rau lawv kom hnov mob thiab koom ua ke rau hauv cov khoom siv kho mob lossis cov khoom tiav, es tsis yog volatilizing rau hauv cov huab cua raws li ib txwm nrog cov pa coatings. Multifunctional monomers, vim hais tias lawv muaj ob lossis ntau qhov chaw reactive, tsim kev sib txuas ntawm oligomer molecules thiab lwm yam monomers hauv kev tsim.
Photoinitiators: Cov khoom xyaw no absorbs lub teeb thiab yog lub luag haujlwm rau kev tsim cov dawb radicals lossis kev ua. Dawb radicals los yog ua yeeb yam yog hom zog siab uas ua rau muaj kev sib txuas ntawm qhov chaw tsis txaus ntseeg ntawm monomers, oligomers thiab polymers. Photoinitiators tsis xav tau rau electron beam kho tshuab vim hais tias cov electrons muaj peev xwm pib crosslinking.
Additives: Feem ntau yog cov stabilizers, uas tiv thaiv gelation nyob rau hauv cia thiab premature curing vim tsawg theem ntawm lub teeb raug. Xim pigments, dyes, defoamers, adhesion promoters, flatting agents, wetting agents and slip aids yog cov piv txwv ntawm lwm yam additives.
Post lub sij hawm: Jan-01-2025
